| Title | Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D) |
| Authors | Wu, Zhongzhen Tian, Xiubo Wei, Yongqiang Gong, Chunzhi Yang, Shiqin Pan, Feng Chu, Paul K. |
| Affiliation | Harbin Inst Technol, State Key Lab Adv Welding & Joining, Harbin 150001, Peoples R China. Peking Univ, Shenzhen Grad Sch, Sch Adv Mat, Shenzhen 518055, Peoples R China. City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China. |
| Keywords | High-power pulsed magnetron sputtering Plasma immersion ion implantation and deposition CrN layer Stress Interface THIN-FILMS COATINGS STEEL |
| Issue Date | 2013 |
| Publisher | 表面和涂层技术 |
| Citation | SURFACE & COATINGS TECHNOLOGY.2013,236,320-325. |
| Abstract | A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII&D) to improve adhesion of multifunctional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40 nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions. and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics. (C) 2013 Published by Elsevier B.V. |
| URI | http://hdl.handle.net/20.500.11897/219301 |
| ISSN | 0257-8972 |
| DOI | 10.1016/j.surfcoat.2013.10.007 |
| Indexed | SCI(E) EI |
| Appears in Collections: | 新材料学院 |
